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High Density Plasma Sources Design, Physics, and Performance (Materials Science and Process Technology Series) by Oleg A. Popov

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Published by Noyes Publications .
Written in English

Subjects:

  • Plasma Physics,
  • Technology: General Issues,
  • Science,
  • Science/Mathematics,
  • Engineering - Mechanical,
  • Physics,
  • Science / Physics,
  • High temperature plasmas,
  • Plasma density,
  • Plasma generators

Book details:

The Physical Object
FormatHardcover
Number of Pages430
ID Numbers
Open LibraryOL8048815M
ISBN 100815513771
ISBN 109780815513773

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High Density Plasma Sources: Design, Physics and Performance. This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon . High Density Plasma Sources: Design, Physics and Performance (Materials Science and Process Technology Series) by Oleg A. Popov and a great selection of related books, art and collectibles available now at   This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other : Elsevier Science. This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and.

4 - Very High Frequency Capacitive Plasma Sources, Pages , Michael J. Colgan, M. Meyyappan 5 - Surface Wave Plasma Sources, Pages , Michel Moisan, Joëlle Margot, Zenon Zakrzewski 6 - Microwave Plasma Disk Processing Machines, Pages , Jes Asmussen 7 - Electron Cyclotron Resonance Plasma Sources, Pages , James E. Stevens. The present book comprises eight chapters which describe the physical principles, design features, plasma parameters, and process operation characteristics of RF and microwave high density plasma sources suitable for use in low pressure ( mtorr), large area (D = em), plasma tools. High density plasma sources: design, physics, and performance. [Oleg A Popov;] -- This book presents a comprehensive description of the most promising high density plasma sources operated at low and intermediate pressures which are used, or could be used, in plasma processing such Your Web browser is not enabled for JavaScript. In parallel plate discharges, the roles of plasma generation and wafer biasing are coupled: higher input power (to increase the plasma density) will simultaneously increase the sheath self-bias potential. 1 There is thus a critical need for high density sources in which the roles of plasma generation and substrate biasing are decoupled, so that.

Electron cyclotron resonance plasma sources. An electron cyclotron resonance (ECR) source can be used to generate high-density plasmas. ECR sources use MW excitation ( GHz) in a resonant cavity similar to that of ICP; however the plasma . High-density plasma source science and engineering. Plasma sources are vitally important for manufacturing functional coatings, flat panel displays, solar cells, semiconductor integrated circuits, and optical thin films. Our research combines advanced modeling with innovative designs to develop high-performance plasma sources, such as. Design of High- Density Plasma Sources for Materials Processing M.A. Lieberman and R.A. Gottscho Electron Cyclotron Resonance Plasma Sources and Their Use in Plasma-Assisted Chemical Vapor Deposition of Thin Films O.A. Popov Unbalanced Magnetron Sputtering S.L. Rohde The Formation of Particles in Thin-Film Processing Plasmas Steinbruchel. sions on useful helicon high-density sources as well as directions for future works are presented in Section 4. 2. Basic features of HW plasma In rf discharges, an oscillating electric field is excited by, e.g. an external antenna, causing plasma production in an .